nano x 6000 automatic wafer measuring system

Metrology Equipment

NanoX-6000 Automatic Wafer Measuring System

An automatic wafer measuring system

NanoX-6000 is an automatic wafer measuring system. It is used to measure wafer critical dimensions (CD) openings, pillar diameter, overlay, EBR, dam, film thickness, and more.

NanoX-6000 Automatic Wafer Measuring System

Specifications

Wafer Size

8 in and 12 in

Cassette

8-in standard cassette, 12 in FOUP, and FOSB

Measuring Mode

Automatic Measuring

Measured Item

Critical dimension (CD), overlay/shift, EBR & dam, height, film thickness, and more.

Power

5X, 20X, 50X

3D

Repeatability ≤0.2% (0.2um min/0.6um max); precision <0.8% (0.2um min/0.8um max)

Film Thickness

Repeatability 2A, precision 20A, measuring range 20nm-300μm

2D

Repeatability<0.2μm, precision 0.6μm

Code Reading

Automatic Code Reading

CPK

≥1.67

Uptime

≥97%

Underkill

0

Overkill

≤ 3%

E84 communication, OHT automatic operation, support secsgem.

MTTR

≤4 h

MTBF

≥ 250 h

Enquiry Form
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