Metrology Equipment
NanoX-3000 Optical Interference Profilometer
Be designed based on technologies such as PSI, VSI and CSI
It features nanometer-scale accuracy, repeatability, stability, and provides quantitative measurement for devices. The following metrics can be measured: surface roughness and profile, step height, and dimensions and morphology features of key parts.
NanoX-3000 Optical Interference Profilometer
Specifications
DUT
MEMS, wafers, glass, precision machinery, ceramic materials, photoelectric materials, and flexible materials
Measured Item
MEMS, wafers, glass, precision machinery, ceramic materials, photoelectric materials, and flexible materials: surface roughness, structural defects, step height and width, and morphology; Black silicon, polycrystal, monocrystal, and grid lines: width and depth measurement, morphology features, and texturing statistics
Interferometry Objective Lens
2.5X, 5X, 10X, 20X, 50X, 100X
Measuring Mode
PSI, VSI, CSI, XSI
Light Source
LED coaxial and circular illumination
Vertical Resolution
<0.1μm
Horizontal Resolution
≥0.35μm (100X objective lens)
Measurement Speed
≤ 35μm/second, depending on the specified CCD (charge-coupled device) and scan mode
RMS Repeatability
0.01nm, 1σ (dedicated for smooth surfaces such as polished surfaces and mirror surfaces in PSI mode
RMS Repeatability
Accuracy: ≤0.75％; Repeatability: ≤0.1%, 1σ
Dimensions
Length≤0.5m, width≤0.5m